@article{CTT100634582,
  author = {Fumitoshi Sugimoto and Yoshihiro Arimoto and Takashi Ito},
  title = {Simultaneous Temperature Measurement of Wafers in Chemical Mechanical Polishing of Silicon Dioxide Layer},
  journal = {Japanese Journal of Applied Physics},
  year = 1995,
}

@article{CTT100634580,
  author = {Fumitoshi Sugimoto and Hiroshi Horie and Yoshihiro Arimoto and Takashi Ito},
  title = {A pH-Controlled Chemical Mechanical Polishing Method for Thin Bonded Silicon-on-Insulator Wafers},
  journal = {Japanese Journal of Applied Physics},
  year = 1995,
}

@article{CTT100634578,
  author = {Kenichi Goto and Tatsuya Yamazaki and Yasuo Nara and Tetsu Fukano and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {Ti Salicide Process for Sub-quarter-Micron CMOS Devices},
  journal = {IEICE TRANSACTIONS on Electronics},
  year = 1994,
}

@article{CTT100634576,
  author = {Kunihiro Suzuki and Tetsu Tanaka and Yoshiharu Tosaka and Hiroshi Horie and Yoshihiro Arimoto and Takashi Ito},
  title = {Analytical Surface Potential Expression for Thin Film Double-Gate SOI MOSFETs},
  journal = {Solid-State Electron},
  year = 1994,
}

@article{CTT100634574,
  author = {Takayuki Aoyama and Kunihiro Suzuki and Hiroko Tashiro and Tatsuya Yamazaki and Yoshihiro Arimoto and Takashi Ito},
  title = {Boron Diffusion Through Pure Silicon Oxide and Oxynitride for Metal-Oxide-Semiconductor Devices},
  journal = {Journal of The Electrochemical Society},
  year = 1993,
}

@article{CTT100634570,
  author = {Yoshihiro Arimoto and Hiroshi Horie and Naoshi Higaki and Manabu Kojima and Fumitoshi Sugimoto and Takashi Ito},
  title = {Advanced Metal Oxide Semiconductor and Bipolar Devices on Bonded Silicon-on-Insulators},
  journal = {Journal of The Electrochemical Society},
  year = 1993,
}

@article{CTT100634573,
  author = {Manabu Kojima and Atsushi Fukuroda and Tetsu Fukano and Naoshi Higaki and Tatsuya Yamazaki and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {High-Speed SOI Bipolar Transistors Using Bonding and Thinning Techniques},
  journal = {IEICE TRANSACTIONS on Electronics},
  year = 1993,
}

@article{CTT100634567,
  author = {Norio Miyata and Tatsuya Yamazaki and Yoshihiro Arimoto and Takashi Ito},
  title = {Intermittent Ultraviolet lrradiation for Silicon Selective Epitaxial Growth},
  journal = {Applied Phisics Letters},
  year = 1992,
}

@article{CTT100634566,
  author = {Toshihiro Sugii and Tatsuya Yamazaki and Yoshihiro Arimoto and Takashi Ito and Yuji Furumura and Ikuo.Namura and Hiroshi Goto and Toshiya Tahara},
  title = {SiC Growth and its Application  to High Speed Si-HBTs},
  journal = {Microelectronic Engineering},
  year = 1992,
}

@article{CTT100634551,
  author = {Atsushi Fukuroda and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {Si Wafer Bonding with Ta Silicide Formation},
  journal = {Japanese Journal of Applied Physics},
  year = 1991,
}

@inproceedings{CTT100634729,
  author = {Hiromasa Hoko and Akira Ohishi and Yoshihiro Arimoto and Takashi Ito},
  title = {Global Planarization for 4 mm Square Pattern},
  booktitle = {Dumic Conference},
  year = 1995,
}

@inproceedings{CTT100634722,
  author = {Akira Sato and Youichi Momiyama and Yasuo Nara and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {A 0.5μm EEPROM Cell Using Poly-Si TFT Technology},
  booktitle = {Proc. 5lth Annual Device Research Conference},
  year = 1993,
}

@inproceedings{CTT100634712,
  author = {Fumio Sugimoto and Hiroshi Horie and Yoshihiro Arimoto and Takashi Ito},
  title = {A pH-  Controlled Chemical Mechanical Polishing Method for Ultra-Thin Bonded SOI  Wafer},
  booktitle = {Dig. of Tech. Papers, Symp. on VLSI Tech.},
  year = 1993,
}

@inproceedings{CTT100634715,
  author = {Kunihiro Suzuki and Tetsu Tanaka and Hiroshi Horie and Yoshihiro Arimoto and Takashi Ito},
  title = {Analytical Surface Potential Expression for Double-Gate SOI MOS FETS},
  booktitle = {Proc. Int. Workshop on VLSI Process and Device Modeling},
  year = 1993,
}

@inproceedings{CTT100634710,
  author = {Takashi Ito and Rinshi Sugino and Yasuhiro Sato and Masaki Okuno and Akira Osawa and Takayuki Aoyama and Tatsuya Yamazaki and Yoshihiro Arimoto},
  title = {Photo-Excited Cleaning of Silicon with Chlorine and Fluorine},
  booktitle = {MRS Symp. Proceeding},
  year = 1992,
}

@inproceedings{CTT100634709,
  author = {Yoshihiro Arimoto and Shinpei Hijiya and Takashi Ito},
  title = {Advanced Bipolar and MOS  Devices Based on Silicon Wafer-Bonding},
  booktitle = {Proc. 1st. Int. Symp. on Semicon. Wafer Bonding, ECS},
  year = 1992,
}

@inproceedings{CTT100634706,
  author = {Naoshi Higaki and Tetsu Fukano and Atsushi Fukuroda and Toshihiro Sugii and Yoshihiro   Arimoto and Takashi Ito},
  title = {A Thin-Base Lateral Bipolar Transistor Fabricated on   Bonded SOI},
  booktitle = {Dig. Tech. Papers of Symp. on VLSI Tech.},
  year = 1991,
}

@inproceedings{CTT100634694,
  author = {Manabu Kojim and Atsushi Fukuroda and Tetsu Fukano and Naoshi Higaki and Tatsuya Yamazaki and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {High-Speed Epitaxial Base Transistors on Bonded SOI},
  booktitle = {IEEE 1991 ,Bipolar Circuits and Technology Meeting},
  year = 1991,
}

@inproceedings{CTT100634690,
  author = {Atsushi Fukuroda and Toru Miyabo and Manabu Kojima and Tetsu Fukano and Naoshi Higaki and Tatsuya Yamazaki and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {Wafer Bonding and Thinning for High-Speed SOI Epitaxial-Base Transistor},
  booktitle = {Ext. Abst. of Int. Conf. on SSDM},
  year = 1991,
}