論文

• Rinshi Sugino, Yoshiko Okui, Masaki Okuno, Mayumi Shigeno, Yasuhisa Sato, Akira Osawa, Takashi Ito. Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning, IEICE TRANSACTIONS on Electronics, The Institute of Electronics, Information and Communication Engineers, Vol. E-75-C, No. 7, pp. 829-833, July 1992.

国際会議発表 (査読有り)

• Takashi Ito, Rinshi Sugino, Yasuhiro Sato, Masaki Okuno, Akira Osawa, Takayuki Aoyama, Tatsuya Yamazaki, Yoshihiro Arimoto. Photo-Excited Cleaning of Silicon with Chlorine and Fluorine, MRS Symp. Proceeding, MRS Symp. Proceeding, 1992.
• Rinshi Sugino, Masaki Okuno, Yoshiko Okui, Mayumi Shigeno, Yasuhisa Sato, Akira Osawa, Takashi Ito. UV Excited Dry Cleaning of Silicon Surfaces Contaminated with lron and Aluminum, Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting, Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting, pp. 512-513, 1991.

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