@article{CTT100692928,
  author = {Akihiro Matsutani and Kunio Nishioka and Mina Sato and Dai Shoji and Daito Kobayashi and Toshihiro Isobe and Akira Nakajima and Tetsu Tatsuma and Sachiko Matsushita},
  title = {Angled etching of (001) rutile Nb-TiO2 substrate using SF6-based capacitively coupled plasma reactive ion etching},
  journal = {Japanese Journal of Applied Physics},
  year = 2014,
}

@inproceedings{CTT100668639,
  author = {小林大斗 and 松谷晃宏 and 西岡國生 and 庄司 大 and 佐藤 美那 and 磯部敏宏 and 中島章 and 立間 徹 and 松下祥子},
  title = {傾斜ドライエッチングを用いた酸化チタンフォトニック結晶の作製と評価},
  booktitle = {},
  year = 2014,
}