@article{CTT100780580,
  author = {Hirokazu Chiba and Rikyu Ikariyama and Shintaro Yasui and HIROSHI FUNAKUBO},
  title = {Growth of Epitaxial Bismuth Ruthenate Pyrochlore Films on Yttria-stabilized Zirconia (YSZ) and YSZ-buffered Si Substrates by Metal-organic Chemical Vapor Deposition},
  journal = {Thin Solid Films},
  year = 2018,
}

@article{CTT100769658,
  author = {Hirokazu Chiba and Masaki Hirano and Kazuhisa Kawano and Noriaki Oshima and Hiroshi Funakubo},
  title = {Effect of substrate type and temperature on the growth of thin Ru films by metal organic chemical vapor deposition},
  journal = {Materials Science in Semiconductor Processing},
  year = 2017,
}

@article{CTT100744140,
  author = {Hirokazu CHIBA and Masaki HIRANO and Kazuhisa KAWANO and Noriaki OSHIMA and Hiroshi FUNAKUBO},
  title = {Effects of substrate surface composition and deposition temperature on deposition of flat and continuous Ru thin films},
  journal = {Journal of the Ceramic Society of Japan},
  year = 2016,
}

@article{CTT100743989,
  author = {Hirokazu CHIBA and Ken-ichi TADA and Taishi FURUKAWA and Toshiki YAMAMOTO and Tadahiro YOTSUYA and Noriaki OSHIMA and Hiroshi FUNAKUBO},
  title = {Low Temperature MOCVD of Ta2O5 with good dielectric property from Ta(NtBu)(OtBu)3 and O2},
  journal = {J. Ceram. Soc. Jpn.},
  year = 2016,
}

@inproceedings{CTT100744803,
  author = {Hirokazu Chiba and Masaki Hirano and Kazuhisa Kawano and Noriaki Oshima and Hiroshi Funakubo},
  title = {Impact of Incubation Time on Deposition of Flat Ru Thin Film on Various Kinds of Substrates at Different Temperature},
  booktitle = {},
  year = 2016,
}

@inproceedings{CTT100721739,
  author = {Hirokazu Chiba and Ken-ichi Tada and Taishi Furukawa and Toshiki Yamamoto and Tadahiro Yotsuya and Noriaki Oshima and Hiroshi Funakubo},
  title = {Low Temperature MOCVD deposited Ta2O5 films with good dielectric property from Ta(NtBu)(OtBu)3 and O2},
  booktitle = {},
  year = 2015,
}

@misc{CTT100807297,
  author = {Hirokazu Chiba},
  title = {Deposition enhancement of thin films by combination design of precursor structure and coreactant gas in metal organic chemical vapor deposition process},
  year = 2018,
}

@misc{CTT100807236,
  author = {Hirokazu Chiba},
  title = {Deposition enhancement of thin films by combination design of precursor structure and coreactant gas in metal organic chemical vapor deposition process},
  year = 2018,
}

@misc{CTT100807244,
  author = {Hirokazu Chiba},
  title = {Deposition enhancement of thin films by combination design of precursor structure and coreactant gas in metal organic chemical vapor deposition process},
  year = 2018,
}

@misc{CTT100807283,
  author = {Hirokazu Chiba},
  title = {Deposition enhancement of thin films by combination design of precursor structure and coreactant gas in metal organic chemical vapor deposition process},
  year = 2018,
}



@phdthesis{CTT100807297,
  author = {Hirokazu Chiba},
  title = {Deposition enhancement of thin films by combination design of precursor structure and coreactant gas in metal organic chemical vapor deposition process},
  school = {東京工業大学},
  year = 2018,
}

@phdthesis{CTT100807236,
  author = {Hirokazu Chiba},
  title = {Deposition enhancement of thin films by combination design of precursor structure and coreactant gas in metal organic chemical vapor deposition process},
  school = {東京工業大学},
  year = 2018,
}

@phdthesis{CTT100807244,
  author = {Hirokazu Chiba},
  title = {Deposition enhancement of thin films by combination design of precursor structure and coreactant gas in metal organic chemical vapor deposition process},
  school = {東京工業大学},
  year = 2018,
}

@phdthesis{CTT100807283,
  author = {Hirokazu Chiba},
  title = {Deposition enhancement of thin films by combination design of precursor structure and coreactant gas in metal organic chemical vapor deposition process},
  school = {東京工業大学},
  year = 2018,
}