@article{CTT100803130,
  author = {Taisei Suzuki and Takao Shimizu and Takanori Mimura and Hiroshi Uchida and Hiroshi Funakubo},
  title = {Epitaxial ferroelectric Y-doped HfO2 film grown by the RF magnetron sputtering},
  journal = {Jpn. J. Appl. Phys.},
  year = 2018,
}

@inproceedings{CTT100771707,
  author = {鈴木大生 and 三村和仙 and 清水荘雄 and 内田寛 and 舟窪浩},
  title = {スパッタリング法による{100}配向Y2O3-HfO2強誘電体エピタキシャル薄膜の作製とその評価},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100748233,
  author = {鈴木大生 and 三村和仙 and 清水荘雄 and 内田寛 and 舟窪浩},
  title = {スパッタリング法によるY2O3-HfO2強誘電体エピタキシャル薄膜作製とその評価},
  booktitle = {},
  year = 2017,
}

@inproceedings{CTT100748227,
  author = {鈴木大生 and 三村和仙 and 清水荘雄 and 内田寛 and 舟窪浩},
  title = {Y2O3-HfO2エピタキシャル薄膜の構成相の決定因子},
  booktitle = {},
  year = 2017,
}