@article{CTT100610001,
  author = {Yukiteru Matsui and Hajime Eda and Satoko Seta and Takatoshi Ono and Yoshikuni Tateyama and Takeshi Nishioka and Hiroyuki Yano and Masabumi Masuko},
  title = {Effects of Addition of Resin Particles to Ceria-Based Slurry on Pre-Metal Dielectric Planarization},
  journal = {Journal of The Electrochemical Society},
  year = 2010,
}

@article{CTT100610002,
  author = {Yukiteru Matsui and Satoko Seta and Masako Kinoshita and Yoshikuni Tateyama and Atsushi Shigeta and Takeshi Nishioka and Hiroyuki Yano and Hirotaka Shida and Kazuo Nishimoto and Masabumi Masuko},
  title = {High Performance Photoresist Planarization Process by CMP with Resin Abrasive for Trench-First Cu/Low-k Dual Damascene Process},
  journal = {Journal of The Electrochemical Society},
  year = 2009,
}