@book{CTT100752645,
  author = {扇澤敏明 and 勝又麗香},
  title = {高分子溶液からのフィルム形成過程における表面・界面の固化現象と残留応力発生メカニズム},
  publisher = {技術情報協会},
  year = 2017,
}

@article{CTT100770315,
  author = {Huang Tao and Reika Katsumata},
  title = {Large Area Fabrication of Graphene Nanoribbons by Wetting Transparency-Assisted Block Copolymer Lithography},
  journal = {POLYMER},
  year = 2017,
}

@inproceedings{CTT100624826,
  author = {Reika Katsumata and Keiichi Kuboyama and Toshiaki Ougizawa},
  title = {Solidification process of polymer solution coating in surface and interfacial region},
  booktitle = {The 3rd Asian Coating Workshop},
  year = 2011,
}

@inproceedings{CTT100624829,
  author = {藤巻彩菜 and 勝又麗香 and 久保山敬一 and 扇澤敏明},
  title = {溶媒キャストフィルムにおける光学異方性から観た基板界面の分子鎖構造},
  booktitle = {第49回日本接着学会年次大会講演要旨集},
  year = 2011,
}

@inproceedings{CTT100624507,
  author = {勝又 麗香 and 阿多 誠介 and 久保山 敬一 and 扇澤 敏明},
  title = {高分子溶液のキャスト成膜における表面・界面の固化現象},
  booktitle = {成形加工学会年次大会年次大会予稿集},
  year = 2011,
}

@inproceedings{CTT100624831,
  author = {勝又麗香 and 阿多誠介 and 久保山敬一 and 扇澤敏明},
  title = {高分子の溶媒成膜過程における表面・界面の固化現象},
  booktitle = {高分子学会予稿集},
  year = 2011,
}

@inproceedings{CTT100624830,
  author = {Reika Katsumata and Seisuke Ata and Keiichi Kuboyama and Toshiaki Ougizawa},
  title = {Origin of Residual Stress and Ways to Reduce It in Solvent Cast Polymer Film},
  booktitle = {The 15th International Coating Science and Technology Symposium Final Program and Extended Abstracts},
  year = 2010,
}

@inproceedings{CTT100610112,
  author = {勝又 麗香 and 阿多 誠介 and 久保山 敬一 and 扇澤 敏明},
  title = {溶媒キャストフィルムの成膜過程における残留応力発現メカニズム},
  booktitle = {高分子学会予稿集},
  year = 2010,
}

@inproceedings{CTT100610115,
  author = {勝又麗香 and 阿多誠介 and 久保山敬一 and 扇澤敏明},
  title = {溶媒キャストフィルムにおける残留応力発生メカニズムと軽減に関する研究},
  booktitle = {成形加工シンポジア},
  year = 2009,
}

@inproceedings{CTT100610108,
  author = {勝又麗香 and 阿多誠介 and 久保山敬一 and 扇澤敏明},
  title = {溶媒キャストフィルムにおける残留ひずみ発現メカニズムとその軽減に関する研究},
  booktitle = {高分子学会予稿集},
  year = 2009,
}