論文

• Tomohito Ogura, tomoya higashihara, mitsuru ueda. Pattern formation of polyimide by using photosensitive polybenzoxazole as a top layer, European Polymer Journal, Vol. 46, No. 7, pp. 1576-1581, Aug. 2010.
• Tomohito Ogura, tomoya higashihara, mitsuru ueda. Development of Photosensitive Poly(hydroximide) with high refractive index, J. Photopolym. Sci.＆Technol., Vol. 23, pp. 515-520, Aug. 2010.
• Masaya Sugiyama, Tomohito Ogura, tomoya higashihara, mitsuru ueda. Development of a Chemically Amplified Photosensitive Polyimide Based on Poly(amic acid), a Dosslution Inhibitor, and a Photoacid Generator, J. Photopolym. Sci.＆Technol., Vol. 23, pp. 483-488, Aug. 2010.
• Yu Nakagawa, Tomohito Ogura, tomoya higashihara, mitsuru ueda. Optically Transparent Sulfur-containing Semi-alicyclic Polyimide with High Refractive Index, Vol. 39, pp. 392-393, Aug. 2010.
• Tomohito Ogura, tomoya higashihara, mitsuru ueda. Low-CTE photosensitive polyimide based on semialicyclic poly(amic acid) and photobase generator., J. Polym. Sci. Part-A, Polym. Chem., Vol. 48, pp. 1317-1323, Apr. 2010.
• Keita Endo, Tomohito Ogura, T. Higashihara, mitsuru ueda. A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator, Polym. J., Vol. 41, pp. 808-809, July 2009.
• Tomohito Ogura, ; Tomoya Higashihara, mitsuru ueda. Development of photosensitive poly(benzoxazole) based on a poly(o-hydroxy amide), a dissolution inhibitor, and a photoacid generator, Vol. 22, pp. 429-436, July 2009.
• Tomohito Ogura, Tomoya Higashihara, Mitsuru Ueda. Direct patterning of poly(amic acid) and low-temperature imidization using a crosslinker, a photoacid generator, and a thermobase generator, J. Polym. Sci., Part A: Polym. Chem., Vol. 47, No. 13, pp. 3362-3369, May 2009.
• Jin-gang LIU, Yasuhiro NAKAMURA, Tomohito OGURA, Yuji SHIBASAKI, Shinji ANDO, mitsuru ueda. Optically Transparent Sulfur-Containing Polyimide-TiO2 Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)-TiO2 Nanocomposite Film, Chemistry of Materials, American Chemical Society, Vol. 20, Issue 1, pp. 273-281, Dec. 2008.  公式リンク  
  
• tomohito ogura, katsuhisa mizoguchi, mitsuru ueda. Development of Negative-type Photosensitive Polyimide, Based on Poly(amic acid)s, Photobase Generator, and Thermal Base Generator, J. Photopolym. Sci.＆Technol., Vol. 21, pp. 125-130, 2008.

国際会議発表 (査読有り)

• Yu Nakagawa, Tomohito Ogura, Tomoya Higashihara, Mitsuru Ueda. Optically transparent sulfur-containing semi-alicyclic polyimide with high refractive index, 240th ACS National Meeting, 240th ACS National Meeting, Preprint, Aug. 2010.
• Tomohito Ogura, Tomoya Higashihara, Mitsuru Ueda. Synthesis of dissolution inhibitor for photosensitive polybenzoxazole, 238th ACS National Meeting, Aug. 2009.

学位論文

• Development of photosensitive polyimide and polybenzoxazole,  Thesis,  Doctor (Engineering),  Tokyo Institute of Technology,  2010/03/26,   

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