論文

• Shiro Hino, Makoto Nakayama, Kenji Takahashi, Hiroshi Funakubo, Eisuke Tokumitsu. Characterization of Hafnium Oxide Thin Films by Sorce Gas Pulse Introduced Metalorganic Chemical Vapor Deposition using Amino-Family Hf Precursors, Jpn. J. Appl. Phys., Vol. 42, Part 1, No. 9B, pp. 6015-6018, Sept. 2003.
• Kenji Takahashi, Makoto Nakayama, Shiro Hino, Eisuke Tokumitsu, Hiroshi Funakubo. Growth of Hafnium Oxide Films by Metalorganic Chemical Vapor Deposition Using Oxygen-Free Hf[N(C2H5)2]4 Precursor and Their Properties, Integrated Ferroelectrics, vol. 57, pp. 1185-1192, Mar. 2003.
• Kenji Takahashi, Makoto Nakayama, Shintaro Yokoyama, Takeshi Kimura, Eisuke Tokumitsu. Preparation of hafnium oxide films from oxygen-free Hf[N(C2H5)2]4 precursor and their properties, Applied Surface Science, No. 216, pp. 296-301, Jan. 2003.

[ BibTeX 形式で保存 ]    [ 論文・著書をCSV形式で保存 ]    [ 特許をCSV形式で保存 ]