論文

• Toru Numaguchi, Toru Umada, Syuichi Tsuzuki. Defect reduction using POU filtration in a new coater/developer, Solid. State Technology, vol. 52, no. 12, p. 19, Dec. 2009.

国際会議発表 (査読有り)

• Toru Numaguchi, Toru Umada, Takehito Mizuno, Syuichi Tsuzuki. New filter rating method in practice for sub 30nm lithography process filter, Proceedings of SPIE, The international Society for Optical Engineering, Aug. 2010.
• Toru Numaguchi, Toru Umada, Fumitake Watanabe, Syuichi Tsuzuki. Filtration condition study for enhanced microbridge reduction, Proceedings of SPIE, The international Society for Optical Engineering, June 2009.
• Toru Numaguchi, Toru Umada, Syuichi Tsuzuki. The first on-site evaluation of a new filter optimized for TARC and developer, Proceedings of SPIE, The international Society of Optical Engineering, May 2008.
• Toru Numaguchi, Takehito Mizuno, Akihisa Namiki, Syuichi Tsuzuki. A novel filter rating method for less than 30nm particles, IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings, p. 361, May 2008.
• Toru Numaguchi, Masayuki Nose, Takehito Mizuno, Syuichi Tsuzuki. Particle removal performance of 20nm rated filters for advanced wet chemical cleaning, IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings, p. 591, May 2007.
• Toru Numaguchi, Toru Umada, Syuichi Tsuzuki. Start up optimization for point of use filter in lithography process, IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings, p. 497, May 2007.

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