国際会議発表 (査読有り)

• Toru Numaguchi, Toru Umada, Takehito Mizuno, Syuichi Tsuzuki. New filter rating method in practice for sub 30nm lithography process filter, Proceedings of SPIE, The international Society for Optical Engineering, Aug. 2010.
• Toru Numaguchi, Takehito Mizuno, Akihisa Namiki, Syuichi Tsuzuki. A novel filter rating method for less than 30nm particles, IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings, p. 361, May 2008.
• Toru Numaguchi, Masayuki Nose, Takehito Mizuno, Syuichi Tsuzuki. Particle removal performance of 20nm rated filters for advanced wet chemical cleaning, IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings, p. 591, May 2007.

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