Journal Paper

• Mina Sato, Mie Tohnishi, Akihiro Matsutani. Microfabrication of Si by KOH Etchant Using Etching Masks Amorphized by Ion Beam Extracted From Electron Cyclotron Plasma, Sensors and Materials, Vol. 36, No. 4, pp. 1319-1328, Apr. 2024.

International Conference (Reviewed)

• Mina Sato, Mie Tohnishi, Miho Fujimoto, Akihiro Matsutani. Submicrometer-sized Patterning of Photoresist by Electron Beam Projection Lithography Using Tabletop Scanning Electron Microscope System and Si Stencil Mask, MNC2024 (37th International Microprocesses and Nanotechnology Conference), 14P-1-6, Nov. 2024.

Domestic Conference (Not reviewed / Unknown)

• Mie Tohnishi. 固体ソースH₂Oプラズマによるフォトレジストのエッチング分布の均一化, 第30回機器・分析技術研究会, Sept. 2024.
• Mie Tohnishi, Sachiko Matsushita, Akihiro Matsutani. Deep-RIEで作製したブラックGeの微細構造側壁のスキャロップ深さと反射率との関係, 第71回応用物理学会春季学術講演会, Mar. 2024.
• Keting Chen, Mie Tohnishi, Akihiro Matsutani, Sachiko Matsushita. Simulations of Ge-Sensitized Thermal Cells with Double Interdigitated Electrodes, The 71st JSAP Spring Meeting 2024, Mar. 2024.
• Mina Sato, Mie Tohnishi, Akihiro Matsutani. イオンビーム照射によりアモルファス化したSi表面のXRR測定, 第71回応用物理学会春季学術講演会, Mar. 2024.
• Akihiro Matsutani, Mie Tohnishi, 吉田 桜子. OsコーティングによるSU-8膜の梁構造の機械的強度の向上, 2024年第71回応用物理学会春季学術講演会, 23p-P05-36, Mar. 2024.

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