論文

• Yukiteru Matsui, Hajime Eda, Satoko Seta, Takatoshi Ono, Yoshikuni Tateyama, Takeshi Nishioka, Hiroyuki Yano, Masabumi Masuko. Effects of Addition of Resin Particles to Ceria-Based Slurry on Pre-Metal Dielectric Planarization, Journal of The Electrochemical Society, Vol. 157, No. 5, pp. H510-H515, Apr. 2010.
• Yukiteru Matsui, Satoko Seta, Masako Kinoshita, Yoshikuni Tateyama, Atsushi Shigeta, Takeshi Nishioka, Hiroyuki Yano, Hirotaka Shida, Kazuo Nishimoto, Masabumi Masuko. High Performance Photoresist Planarization Process by CMP with Resin Abrasive for Trench-First Cu/Low-k Dual Damascene Process, Journal of The Electrochemical Society, Vol. 156, No. 7, pp. H548-H554, May 2009.

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