論文

• N. Sasaki, . Lim, J, . Hanna. Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD, J. Non-Cryst. Solids, Vol. 354, p. 2079, Feb. 2008.

国際会議発表 (査読有り)

• Naoto Sasaki, Jun-ichi Hanna. Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD, Journal of Non-Crystalline Solids, Vol. 354, No. 18-25, pp. 2079-2082, June 2008.
• N. Sasaki, C. Lim, J. Hanna. Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD, 22nd International Conference on Amorphous and Nanocrystalline Semiconducto, Aug. 2007.

国内会議発表 (査読なし・不明)

• 佐々木直人, 半那純一. Si2H6-F2系反応性CVD法によるa-Si薄膜とTFTの作製, 第69回応用物理学会学術講演会, 第69回応用物理学会学術講演会講演予稿集, Sept. 2008.

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