論文

• Toshihiko Kaneda, Daisuke Hirose, Takaaki Miyasako, PhanTrong Tue, Yoshitaka Murakami, Shinji Kohara, Jinwang Li, Tadaoki Mitani, Eisuke Tokumitsu, Tatsuya Shimoda. Rheology printing for metal-oxide patterns and devices, Journal of Materials Chemistry C, Vol. 2, No. 1, pp. 40-49, Feb. 2014.
• Koji Nagahara, Bui Nguyen Quoc Trinh, Eisuke Tokumitsu, Satoshi Inoue, Tatsuya Shimoda. Fabrication of 120-nm-channel-length ferroelectric-gate thin-film transistor by nanoimprint lithography, Jpn. J. Appl. Phys., Vol. 53, pp. 02BC14-1, Jan. 2014.
• Kenichi Umeda, Takaaki Miyasako, Ayumu Sugiyama, Atsushi Tanaka, Masayuki Suzuki, Eisuke Tokumitsu, Tatsuya Shimoda. All solution-processed amorphous oxide thin-film transistors using UV/O3 treatment, Jpn. J. Appl. Phys., Vol. 53, pp. 02BE03-1-5, Jan. 2014.
• Phan Trong Tue, Takaaki Miyasako, Koichi Higashimine, Eisuke Tokumitsu, Tatsuya Shimoda. Surface-modified lead-zirconium-titanate system for solution-processed ferroelectric-gate thin-film transistors, Applied Physisces A, Vol. 113-2,, pp. 333-338, Nov. 2013.
• Pham Van Thanh, Bui Nguyen Quoc Trinh, Takaaki Miyasako, Phan Trong Tue, Eisuke Tokumitsu, Tatsuya Shimoda. Interface Charge Trap Density of Solution Processed Ferroelectric Gate Thin Film Transistor Using ITO/PZT/Pt Structure, Ferroelectrics Letters Section, Vol. 40, pp. 17-29, Jan. 2013.
• Phan Trong Tue, Takaaki Miyasako, Jinwang Li, Huynh Thi Cam Tu, Satoshi Inoue, Eisuke Tokumitsu, Tatsuya Shimoda. High-performance solution-processed ZrInZnO thin-film transistors, IEEE Transactions on Electron Devices, Vol. 60, No. 1, pp. 320-326, Jan. 2013.
• Jinwang Li, Eisuke Tokumitsu, Mikio Koyano, Tadaoki Mitani, Tatsuya Shimoda. Highly conductive p-type amorphous oxides from low-temperature solution processing, Appl. Phys. Lett., No. 101, pp. 132104-1-4, Sept. 2012.
• Pham Van Thanh, Bui Nguyen Quoc Trinh, Takaaki Miyasako, Phan Trong Tue, Eisuke Tokumitsu, Tatsuya Shimoda. Electric Properties and Interface Charge Trap Density of Ferroelectric Gate Thin Film Transistor Using (Bi,La)4Ti3O12/Pb(Zr,Ti)O3 Stacked Gate Insulator, JPN. J. APPL. PHYS., Vol. 51, pp. 09LA09-1-5, Sept. 2012.
• Jinwang Li, Toshihiko Kaneda, Eisuke Tokumitsu, Mikio Koyano, Tadaoki Mitani, Tatsuya Shimoda. P-type conductive amorphous oxides of transition metals from solution processing, Appl. Phys. Lett., No. 101, pp. 052102-1-5, July 2012.
• Hiroyuki Kameda, Jinwang Li, Dam Hieu Chi, Ayumi Sugiyama, Koich Higashimine, Tomoya Uruga, Hajime Tanida, Kazuo Kato, Toshihiko Kaneda, Takaaki Miyasako, Eisuke Tokumitsu, Tadaoki Mitani, Tatsuya Shimoda. Crystallization of lead zirconate titanate without passing through pyrochlore by new solution process, Journal of the European Ceramic Society, vol. 32, pp. 1667-1680, Feb. 2012.
• Tue T. Phan, Trinh Q. Bui Nguyen, Takaaki Miyasako, Thanh V. Pham, Eisuke Tokumitsu, Tatsuya Shimoda. Lanthanum Oxide Capping Layer for Solution-processed Ferroelectric-gate Thin-film Transistors, 2011 Spring meeting, Materials Research Society Symp., 2011 Spring meeting, Materials Research Society Symp. Proc., 1337, Aug. 2011.
• Takaaki Miyasako, Bui Nguyen Quoc Trinh, Masatoshi Onoue, Toshihiko Kaneda, Phan Trong Tue, Eisuke Tokumitsu, Tatsuya Shimoda. Ferroelectric-Gate Thin-Film Transitor Fabricated by Total Solution Deposition Process, Jpn. J. Appl. Phys., Vol. 50, pp. 04DD09-1-6, Apr. 2011.
• PHAN TRONG TUE, TAKAAKI MIYASAKO, BUI NGUYEN QUOC TRINH, JINWANG LI, EISUKE TOKUMITSU, Tatsuya Shimoda. Optimization of Pt and PZT Films for Ferroelectric-Gate Thin Film Transistors, Ferroelectrics, Dec. 2010.
• Takaaki Miyasako, Bui Nguyen Quoc Trinh, Masatoshi Onoue, Toshihiko Kaneda, Phan Tron Tue, Eisuke Tokumitsu, Tatsuya Shimoda. Totally solution-processed feerroelectric-gate thin-film transistor, Applied Physics Letters, Vol. 97, No. 17, pp. 173509-1-3, Oct. 2010.
• Jinwan Li, Hiroyuki Kameda, Bui Nguyen Quoc Trinh, Takaaki Miyasako, Phan Tron Tue, Eisuke Tokumitsu, Tadaoki Mitani, Tatsuya Shimoda. A low-temperature crystallization path for device-quality ferroelectric films, Applied Physics Letters, Vol. 97, No. 102905, pp. 1-3, Sept. 2010.
• Toshihiko Kaneda, Joo-Nam Kim, Eisuke Tokumitsu, Tatsuya Shimoda. Improvement of Sol-Gel Derived PbZrxTi1-xO3 Film Properties Using Thermal Press Treatment, Jpn. J. Appl. Phys., Vol. 49, pp. 09MA08-1-3, Sept. 2010.

国際会議発表 (査読有り)

• Phan Trong Tue, Toshihiko Kaneda, Daisuke Hirose, Takaaki Miyasako, Yoshitaka Murakami, Shinji Kohara, Jinwang Li, Tadaoki Mitani, EisukeTokumitsu, Tatsuya Shimoda. Fabrication of Oxide Thin-Film Transistors Using the Newly Developed Rheology Printing Method, 2014 Spring meeting & Exhibit, Materials Research Society, Apr. 2014.
• Daisuke Hirose, Toshihiko Kaneda, Takaaki Miyasako, Phan T. Tue, Yoshitaka Murakami, Shinji Kohara, Jinwang Li, Tadaoki Mitani, Eisuke Tokumitsu, Shogo Nobukawa, Tatsuya Shimoda. Rheological Properties of the ITO Gel and Its Application for Forming Nano-Patterns by Imprinting, 2014 Spring meeting & Exhibit, Materials Research Society, Apr. 2014.
• Koji Nagahara, Bui Nguyen Quoc Trinh, Eisuke Tokumitsu, Satoshi Inoue, Tatsuya Shimoda. 120 nm Channel Length Ferroelectric-Gate Thin Film Transistor by Nanoimprint Lithography, The 4th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-NANO 2013), June 2013.
• Kenichi Umeda, Takaaki Miyasako, Ayumu Sugiyama, Atsushi Tanaka, Masayuki Suzuki, Eisuke Tokumitsu, Tatsuya Shimoda. All Solution-Processed Amorphous Oxide Thin Film Transistors via UV/O3 Treatment, The 4th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-NANO 2013), June 2013.
• Jinwang Li, Eisuke Tokumitsu, Mikio Koyano, Tatsuya Shimoda. P-type Amorphous Oxide Semiconductors Ln-Ru-O from Solution Processing, 2011 Fall meeting, Materials Research Society, Nov. 2011.
• Takaaki Miyasako, Masatoshi Onoue, Hirokazu Tsukada, Eisuke Tokumitsu, Tatsuya Shimoda. Solution-processed oxide thin-film transistors using La-Ta-O/Bi-Nb-O stacked gate insulator, 2011 Fall meeting, Materials Research Society, Nov. 2011.
• Masatoshi Onoue, Takaaki Miyasako, Eisuke Tokumitsu, Tatsuya Shimoda. High performance Bi-Nb-Ox thin-film capacitors fabricated by chemical solution deposition process, 2011 Fall meeting, Materials Research Society, Nov. 2011.
• Joo-Nam Kim, Toshihiko Kaneda, Eisuke Tokumitsu, Tatsuya Shimoda. Leakage Cuurent property of the PZT films improved by thermal press treatment, The 10th international conference on Nanoimprint and Nanoprint Technology (NNT 2011), Oct. 2011.
• Bui Nguyen Quoc Trinh, Toshihiko Kaneda, Takaaki Miyasako, Pham Van Thanh, Phan Trong Tue, Eisuke Tokumitsu, Tatsuya Shimoda. Nano-sized PT Lines and Spaces Patterned by Nanoimprint Lithography and physical Dry-etching Method, The 10th international conference on Nanoimprint and Nanoprint Technology (NNT 2011), Oct. 2011.
• Joo-Nam Kim, Toshihiko Kaneda, Eisuke Tokumitsu, Tatsuya Shimoda. Leakage Cuurent property of the PZT films improved by thermal press treatment, The 10th international conference on Nanoimprint and Nanoprint Technology (NNT 2011), Oct. 2011.
• Bui Nguyen Quoc Trinh, Takaaki Miyasako, Toshihiko Kaneda, Pham Van Thanh, Phan Trong Tue, Eisuke Tokumitsu, Tatsuya Shimoda. Data Disturbance-free NAND-type Ferroelectric-gate Thin Film Transistor Array using Sol-gel ITO and Stacked (BLT/PZT) Gate Insulator, 2011 International Conference on Solid State Devices and Materials (SSDM 2011), Sept. 2011.
• Eisuke Tokumitsu, Yasuhiro Takahashi, Toshihiko Kaneda, Tatsuya Shimoda. Source solution dependence on electrical properties of In-Zn-O channel thin film transistors, E-MRS 2011 Fall Meeting, Sept. 2011.
• Bui Nguyen Quoc Trinh, Takaaki Miyasako, Toshihiko Kaneda, Phan Trong Tue, Pham Van Thanh, Eisuke Tokumitsu, Tatsuya Shimoda. SUB-MICRON FERROELECTRIC-GATE THIN FILM TRANSISTOR USING SOL-GEL ITO CHANNEL AND STACKED (BLT/PZT) INSULATOR, International Symposium on Intergrated Functionalities(ISIF 2011), July 2011.
• Thanh V. Pham, Quoc Trinh N. Bui, Tue T. Phan, Takaaki Miyasako, Eisuke Tokumitsu, Tatsuya Shimoda. Analysis on Interface Layer Between Pt Electrode and Ferroelectric Layer of Solution-processed PZT Capacitor, 2011 Spring meeting, Materials Research Society, Apr. 2011.
• Phan Tue, Bui Trinh, Takaaki Miyasako, Eisuke Tokumitsu, Tatsuya Shimoda. Fabrication and Characterization of a Ferroelectric-Gate FET with a ITO/PZT/SRO/Pt Stacked Structure”, ,, 22nd International Conference on Microelectronics (ICM 2010), Dec. 2010.
• Phan Trong Tue, Takaaki Miyasako, Bui Nzuyen Quoc Trinh, Jinwang Li, Eisuke Tokumitsu, Tatsuya Shimoda. OPTIMIZATION OF Pt AND PZT FILMS FOR FERROELECTRIC-GATE THIN FILM TRANSISTORS, 12th Inter. Meeting on Ferroelectricity & 18th IEEE Intern.Symposium on the Applications of Ferroelectrics (IMF-IASF-2009), Aug. 2009.

国内会議発表 (査読有り)

• Pham Van Thanh, Bui Nguyen Quoc Trinh, Takaaki Miyasako, Phan Trong Tue, Eisuke Tokumitsu, Tatsuya Shimoda. Electric properties and interface charge state of ferroelectric gate transistor using BLT/PZT hybrid as gate insulator, 第29回強誘電体応用会議(FMA28), May 2012.
• 清水貴也, 羽賀健一, 徳光永輔, 金田敏彦, 下田達也. 様々な液体原料を用いたIn-Zn-O薄膜の形成と薄膜トランジスタ応用, 薄膜材料デバイス研究会、第８回研究集会, Nov. 2011.

国際会議発表 (査読なし・不明)

• Takaaki Miyasako, Bui Nguyen Quoc Trinh, Toshihiko Kaneda, Masatoshi Onoue, Phan Trong Tue, Eisuke Tokumitsu, Tatsuya Shimoda. Ferroelectric-Gate Thin-Film Transistor Fabricated by Total Solution Deposition Process, 2010 International Conference on Solid State Devices and Materials, Vol. E-3-4L, pp. 1092-1093, Sept. 2010.

国内会議発表 (査読なし・不明)

• 徳光永輔, 下田達也. 溶液プロセスによる酸化物チャネル強誘電体ゲートトランジスタの作製, 応用物理学会北陸・信越支部シンポジウム、第2回有機・無機エレクトロニクスシンポジウム, July 2014.

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