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LimCheol 研究業績一覧 (11件)
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論文
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Cheol-hyun.Lim,
Jeong-Woo Lee,
Jun-ichi. Hanna.
Deposition of Device grade poly-Si films on glasssubstrate directly at 450oC and fabrication of bottom-gate poly-Si TFTs,
July 2009.
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Cheol-hyun Lim,
Jeong-Woo Lee,
Jun-ichi Hanna.
CVD-Produced Polycrystalline Silicon Thin Film Prepared by Fluorine-Mediated Crystal Growth on a Glass Substrate and its Thin Film Transistor Application,
Chem. Vapor. Depo.,
Vol. 14,
No. 5-6,
pp. 107-110,
July 2008.
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N. Sasaki,
. Lim, J,
. Hanna.
Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD,
J. Non-Cryst. Solids,
Vol. 354,
p. 2079,
Feb. 2008.
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Cheol-hyun Lim,
Jun-ichi Hanna.
Improvement ofin electrical characteristics of Plasma enhanced Chemical Vapor Deposition–teraethoxylsilane–SiO2 by atomic hydrogen passivation via hot-wire technique,
Jpn. J. Appl. Phys.,
Vol. 45,
No. 48,
pp. L1270-1272,
July 2006.
国際会議発表 (査読有り)
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Jun-ichi Hanna,
Cheol-hyun Lim.
Deposition of Poly-SiGe Thin Films by Reactive Thermal CVD and Their TFT Applications,
MRS Spring Meeting 2010,
Proceedings of MRS Spring Meeting 2010,
Apr. 2010.
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Cheol-hyun Lim,
Tatsuya Hoshino,
Jun-ichi Hanna.
Direct deposition technique for poly-SiGe thin film achieving a mobility exceeding 20 cm2/Vs with ~30 nm thick bottom-gate TFTs,
IMID 2009,
IMID 2009 Digest,
Oct. 2009.
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Jeong-Woo Lee,
Cheol hyun Lim,
Jun-ichi Hanna.
Deposition of device grade poly-Si films on glass substrate directly at 450 °C and fabrication of bottom-gate poly-Si TFTs,
Journal of Non-Crystalline Solids,
Vol. 354,
No. 18-25,
pp. 2500-2504,
June 2008.
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N. Sasaki,
C. Lim,
J. Hanna.
Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD,
22nd International Conference on Amorphous and Nanocrystalline Semiconducto,
Aug. 2007.
国内会議発表 (査読有り)
国際会議発表 (査読なし・不明)
国内会議発表 (査読なし・不明)
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